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    • PVA TePla America, LLC
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    PVA TePla America, LLC/Products/Microwave Plasma Systems/Microwave Plasma Photoresist Ashing

    Microwave Plasma Photoresist Ashing

    The microwave plasma systems for photoresist ashing come in both batch or single-wafer configurations are combined in the GIGABatch or GIGAfab product range. These systems are available in various configurations depending on the type of substrate or the customer’s application requirement—from the manually loaded system to the fully automatic version.

    Depending on the application, these systems can be equipped with various types of plasma sources: from simple and cost-effective microwave sources and large-scale sources to radical sources with a remote plasma for temperature-sensitive silicon etching processes for thinned wafers. The wafer can be tempered with various concepts here.

    In the manually loaded systems, the chamber has a pull-out door, and the wafers lie on the heating or cooling plant mounted on the door. In the automatic systems, the wafers are loaded into the chamber with a robot system by means of on-the-fly alignment.

    Gigabatch Series Microwave Plasma Systems

    The GIGAbatch series is the latest and most advanced generation of MW batch ashers offered today and is the successor of the very popular Tepla 300 series. These are used extensively for photoresist ashing, descum, wafer cleaning

    Gigabatch Series Microwave Plasma Systems

    GIGAfab Gen 2

    The plasma system GIGAfab Gen2 is designed for process development of flat panel displays. The chamber is loaded manually. The glass plates are easily placed in a flat position on the extractable drawer.

    GIGAfab Gen 2

    GIGAFAB MICROWAVE PLASMA SYSTEMS A200-300

    The GIGAfab A is a compact, high-performance, automatic Single Wafer Asher. It is designed to serve main stream semiconductor photoresist stripping, esp. hi-dose implanted resist, MEMS-manufacturing and descum applications for wafer sizes up to 300 mm.

    GIGAFAB MICROWAVE PLASMA SYSTEMS A200-300

    GIGAfab Modular

    Single Wafer Asher with proprietary Microwave Plasma Source The Automatic Single Wafer Asher GIGAfab LED is designed to serve fabrication…

    GIGAfab Modular

    Ion Wave 10 Gas Plasma System

    Microwave generates higher density plasma (ions/radicles) and a lower induced bias voltage across the substrate compared to rf plasma. Because of this fact, the ashing rate of photo resist in microwave plasma

    Ion Wave 10 Gas Plasma System

    MICROWAVE PLASMA SYSTEM GIGAFAB M

    The GIGAfab series targets SU-8 Removal, MEMS Fabrication, Wafer Bumping and Flat Panel Display Technology. Unique planar source geometry.

    MICROWAVE PLASMA SYSTEM GIGAFAB M