Microwave generates higher density plasma (ions/radicles) and a lower induced bias voltage across the substrate compared to rf plasma. Because of this fact, the ashing rate of photoresist in microwave plasma is expected to be higher and the plasma damage lower. The IoN Wave 10 plasma system is designed for R&D and small scale production applications. PVA TePla is a proven and trusted resource globally for high-quality, reliable, cost-effective and easy to operate gas plasma systems. It offers some of the most advanced and innovative solutions for a wide variety of applications.
