Microwave Plasma Photoresist Ashing
The microwave plasma systems for photoresist ashing come in both batch or single-wafer configurations are combined in the GIGABatch or…
Microwave generated plasma is the superior plasma technology for microchip fabrication.
Microwave plasma creates an etching process, which is very isotropic and behaves very similar to a wet stripping process. The very high electron density and low kinetic ion energy makes this process ideal for removal of polymers while causing very little surface damage.
The microwave plasma systems for photoresist ashing come in both batch or single-wafer configurations are combined in the GIGABatch or…
