(manual loading version)
The plasma system GIGAfab Gen2 is designed for process development of flat panel displays. The chamber is loaded manually. The glass plates are easily placed in a flat position on the extractable drawer. Depending on the gas selected, the plasma has various chemical effects on the surface to be treated. The efficient microwave plasma source has no electrodes, ensuring fast and uniform processing of large substrates.
The GIGAfab Gen2 P is designed for production and features automated loading capabilities by an external robot. The system is equipped with a temperature controlled substrate plate with pins and gate valve.
(manual loading version) The planar source technology allows easy scaling to larger panel size.
Aluminum
W x H x D = 720 x 140 x 620 mm
MW Frequency 2.45 GHz, max. 4000 Watt
variable power
W x H x D = approx. 1.750 x 1.700 x 950 mm
Weight: 750 kg
Additional Gas Channel
