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    • PVA TePla America, LLC
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    Photoresist Ashing

    Plasma photoresist ashing following etching and ion implantation is one of the most important and frequently performed steps in semiconductor fabrication. The number of lithography cycles can vary typically from 10 to 25.

    IoN 10Q Plasma System

    The IoN 10Q Plasma System is a barrel plasma reactor designed for R&D and production applications. The technology is based…

    Ion 40Q Plasma System

    IoN 40Q Plasma System The Ion 40Q Plasma System is a barrel type plasma reactor. It is designed for batch…

    Photoresist Ashing IoN 100-40Q Plasma System

    The Photoresist Ashing IoN 100-40Q Plasma System is a barrel plasma reactor designed for high volume production applications. The technology…

    Photoresist Ashing IoN 100WB-40Q

    The photoresist ashing IoN 100WB-40Q plasma system is designed for R&D and low volume production applications. The technology is based…

    PHOTORESIST ASHING IoN 10V

    SINGLE WAFER ASHING SYSTEM The Photoresist Ashing IoN 10V plasma system is a manual load single wafer RF plasma Ashing,…