Ion 40Q Plasma System

IoN 40Q Plasma System

The Ion 40Q Plasma System is a barrel type plasma reactor. It is designed for batch processing wafers for photoresist strip, descum, nitride etch and other cleaning applications in semiconductor, LED, and MEMS fabrication. The IoN 40Q technology is based on proven reactor designs developed by our company over 40 years (International Plasma Corporation, Branson IPC, Dionex, Gasonics, Metroline, TePla and finally PVA TePla). Today’s IoN 40Q is designed to meet the evolving demands of our customers, emphasizing versatility and control for their surface treatment needs. Its advanced features provide state of the art process control, fail-safe system alarms and data capturing software. This enables the system to meet stringent quality control programs required to manufacture Semiconductor, LED and MEMS devices. The IoN 40Q uses radio frequency (RF) generated plasma in a compact, fully integrated package

Features include:

• Low particulate quartz reactor chamber
• Plug and play self installation
• Energy saving control feature for lowest cost of ownership
• Industrial computer with a Windows® based system
• Graphical User Interface (GUI) software complies to Semi
• E95-1101 standards
• Receipe driven processes
• Sophisticated alarm features and process tolerance controls
• allowing precise lot-to-lot repeatability
• Data logging and process statistics monitoring via Ethernet
• Onboard diagnostic features and alarm logging
• LCD touch panel and keyboard
• Optical end point detection
• Selectable fast or slow venting modes
• Through-wall mounting with full rear maintenance
• capability

Technical Data