Immediate Contact

    Please complete all fields marked with *.

    data protection regulations.

    Data Protection

    • PVA TePla America, LLC
    • 251 Corporate Terrace
      Corona, Ca 92879.

    Photoresist Ashing IoN 100-40Q Plasma System

    IoN 100 40Q

    The Photoresist Ashing IoN 100-40Q Plasma System is a barrel plasma reactor designed for high volume production applications. The technology is based on the proven reactor designs developed over the course of 50+ years by International Plasma Corporation, Branson ICP, Dionex, Gasonics, Metroline, TePla and finally PVA TePla. IoN 100-40Q uses a larger chassis that provides all the gas and power connections.

    Features include:

    • Plug and play self installation
    • Industrial computer with LCD touch panel and keyboard. Windows based operating system.
    • Graphical User Interface (GUI) software complies with CFR Title 21 Part 11 and Semi E95-1101
    • Multi-level of user access
    • Software
      • Recipe editor for fast and versatile step controls
      • Onboard diagnostic features and alarm logging
      • Remote process monitoring via Ethernet
      • Online web based simulation/training/support
    • Vacuum pump power outlet on the chassis
    • Energy saving feature for vacuum pump

    Typical Applications:

    • Photoresist ashing and descum
    • Surface cleaning
    • Surface activation

    IoN 100-40Q Plasma System Technical Data

    Process Chamber

    Material: Quartz chamber
    Dimensions: 304 mm D x 508 mm L (12”X20”)
    Volume: 37 L (1.31 ft3)
    Chamber Opening: 289.56 mm (11.4”)
    Electrodes: Clam-shell
    Number of MFCs: 1
    Process Pressure: (0.16 to 2.66) mbar (120 to 2000) mTorr
    Base Pressure: 0.07 mbar (50 mTorr)
    Pumping Time: 1 min (Pump dependent)
    Wafer Sizes: Up to 200 mm (8”) Batch size (Boat):
    25 wafers of diameter 200 mm (8”)
    50 wafers of diameter 150 mm (6”)
    Wafer Loading: Manual
    Plasma Source Frequency/power: 13.56 MHz/600 W

    Performance Data

    Uptime: 95%
    MTBF: >500 h
    MTTR: <2 h

    Options

    • Automated quartz boat loading/unloading
    • 13.56 MHz/1000 W plasma source
    • Secondary plasma
      • Faraday/Etch tunnel
    • Additional MFCs/up to additional five gasses
    • Endpoint Detection
      • Single wavelength
      • Spectrographic
    • Process pressure control
    • Light tower with R/Y/G/Buzzer
    • Barcode scanner; RGA; Printer
    • Vacuum pumps (Rotary vane, dry)
    • Onboard gas generators (H2, N2, O2)
    • Wall mounting package
    • SECS/GEM interface

    Chassis

    • Large roll around chassis with leveling feet
    • Self contained footprint featuring all facilities connections including vacuum pump power control

    Machine Dimension and Weight

    737 mm W x 1067 mm D x 1981 mm H (29”x42”x78”) 318 kg (701 lb) (Varies with options)

    Facilities Requirements

    Electricity: 208/240 VAC, 3f, 50/60 Hz, 5-wire, 12.8 kW
    Process Gas Input Pressure: 2 bar (30 psi)
    Purge Gas Input Pressure: 2 bar (30 psi)
    Compressed Air Input Pressure: 6 bar (88 psi)

    Safety Certification Standards

    • CE certified
    • EN 60204
    • EN 61326