IoN 100WB-40 Plasma System
The IoN 100WB-40 plasma system is a barrel plasma reactor designed for R&D and production applications. The technology is based on the proven reactor designs developed over the course of 50+ years by International Plasma Corporation, Branson ICP, Dionex, Gasonics, Metroline, TePla and finally PVA TePla. The IoN 100WB-40 is derived from the IoN 100-40, on a smaller chassis that has all the same plasma qualities as that of IoN 100-40, except the pump power connection. The IoN 100WB-40 plasma system requires a facilities power outlet for powering the vacuum pump.
Features Include:
- Plug and play self installation
- Flexible electrode configurations to accommodate small size to large size 3-D parts processing to maximize throughput
- Industrial computer with LCD touch panel and keyboard. Windows based operating system.
- Graphical User Interface (GUI) software complies with CFR Title 21 Part 11 and Semi E95-1101
- Multi-level user access operator, engineering and maintenance
- Software
- Recipe editor for fast and versatile step controls
- Onboard diagnostic features and alarm logging
- Remote process monitoring via Ethernet
- Online web based simulation, training, and support
Typical Applications:
- Surface cleaning
- Surface activation
- Surface functionalization
- Deposition of siloxane and organic thin films
IoN 100WB-40 Plasma System Technical Data
Process Chamber
Chamber Material: Aluminum
Dimension/Volume: 330mm x 483mm x 229mm
(WxDxH)/36.43 liters
(13”x19”x9”) (WxDxH)/1.29ft3
Electrodes: Removable 5 Shelf
Number of standard MFCs: 1
Process Gas: 1
Process Pressure: 0.16-2.66mbar (120-2000mTorr)
Base Pressure/Time: 0.07mbar (50mTorr)/1min
Loading: Manual
Plasma Generator
Frequency/power: 13.56MHz/300W with automatic
matching network (air cooled)
Performance Data
Uptime: 95%; MTBF: >500hr; MTTR: <2hr
Safety Certification Standards
- CE certified
- EN 60204
- EN 61326
Options
- Automated robotic loading/unloading
- Stainless steel chamber
- Electrodes:
- Shelf electrodes 3/5
- Multishelf with 3/5 or 7 shelve
- Removable 3 shelve
- Vertical or side wall or ceiling
- Water cooled—horizontal 3 shelve
- Power cage
- Secondary plasma
- Plasma generators
- 13.56MHz/600W with automatic matching network (air cooled)
- 20-100kHz/300W or 600W with manual matching network (air cooled)
- Two (2) additional MFCs.
- Corrosive gas MFC’s
- Alternate gas flow selector up to five additional gasses
- (controls two unique gases utilizing one MFC)
- Liquid monomer delivery kits
- High vapor pressure monomers
- Low vapor pressure monomers
- Downstream pressure control, 1% pressure monitor
- Selectable venting mode (fast or slow)
- Light tower
- Vacuum pumps (rotary vane, dry, scroll and blower
- package)
- Onboard gas (H2, N2, O2) generation package
- Wall mount flange package for through-wall mounting with full rear maintenance option
- SECS/GEM interface
Chassis
- Small roll around chassis with leveling feet
- Self contained footprint featuring all gas connections and all power connections except the vacuum pump power
Facilities Requirements
Electricity: 208-240VAC, 1 phase, 50/60Hz,
3-wire, 4.8kW
Process Gas Input pressure: 2bar (30psi)
Purge Gas Input pressure: 2bar (30psi)
Compressed Air Input pressure: 6bar (88psi)
Machine Dimension and Weight
737mm x 1067mm x 1524mm (29”x42”x60”) (WxDxH)
239kg (527lb) (varies with options)
