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    • PVA TePla America, LLC
    • 251 Corporate Terrace
      Corona, Ca 92879.

    MICROWAVE PLASMA SYSTEM GIGA 690

    The Plasma System GIGA 690 is a state-of-the-art plasma processing equipment. It is a PC-controlled production tool, featuring all options of data communication, and moreover, it is the most versatile plasma cleaning system in the world of chip packaging.

    Featuring electrode-free energy feeding and plasma generation, the GIGA 690 system delivers unsurpassed flexibility. This electrode-free power coupling is key to the treatment of substrates in closed, non-slotted magazines in the downstream process.

    Slotted magazines are processed perfectly on a rotating platform.

    In addition, the ECR mode is an extra function of this plasma system.

    PVA TePla’s unique microwave plasma processing technology serves a broad spectrum of applications including plasma cleaning before wire bond, mold and solder ball attach, as well as plasma cleaning and activation prior to Flip Chip underfill and undermold. 

    Our process capability upgrade, introducing pure H2, is one more decisive benefit. It provides e.g. unparalleled cleaning performance prior to wire bonding by removing oxide layers, sulphur residues or other inorganic impurities (H2 safety certificate available).

    As a most modern production tool, the Microwave Plasma System GIGA 690 provides high throughput and serves the full range of chip packaging applications.

    The system is featuring a highly attractive graphical user interface and is programmed with an easily mastered operating platform. The Plasma System GIGA 690 is available with a hinged or sliding-type door design.

    Process Chamber

    • Material Aluminum
    • Volume 91 liters
    • Inner dimensions 450 x 450 x 450 mm
    • No RF- electrodes inside chamber

    Vacuum System

    • Vacuum connection DN 63 ISO K
    • Process gas control 2 gas channels standard,
    • each with MFC and solenoid valve
    • Base pressure Approx. 2 x 10-2 mbar
    • Process pressure Approx. 0.2–2 mbar
    • Evacuation time Approx. 1 minute
    • Vacuum gauge Capacitance manometer,
    • 10-2 to 10 mbar
    • Venting Solenoid valve

    Performance Data

    • Uptime >95%
    • MTBF >500 h
    • MTTR <2 h

    System Control

    • Hardware PC based system controller
    • 10,4″ monitor, GUI
    • Light Tower system status r/g/y
    • Software Realtime Operating System QNX
    • Manual and automatic system control
    • multiple recipe storage
    • Process recipe up to 100 recipes
    • with 1-10 steps each
    • System selftest routine,
    • warnings error message dialog
    • Soft- and hardware safety interlocks,
    • optical plasma intensity monitoring

    Supplies

    • Electricity 230 V, single-phase, 15 A, 50/60 Hz
    • Process gas 1/4“ Swagelok connector,
    • input pressure 1–2 bar
    • Compressed air 1/4“ Swagelok connector,
    • input pressure 4–6 bar

    Plasma Source

    • Microwave Generator
    • Frequency 2.45 GHz
    • Adjustable magnetron, air-cooled,
    • proprietary antenna and coupling geometry
    • Power 0–1.000 W

    Dimensions

    • W/H/D Approx. 1.050 x 1.750 x 800 mm
    • Weight 195 kg (system only, excluding pump)

    Options

    • Pumping system Vacuum pump system comprising
    • rotary vane pump or combination of
    • rotary vane pump and 250 m3/h
    • (145 cfm) rootsblower,
    • 400 V, 3 phase, 32 A max.
    • Rotary platform Aluminum, 400 mm Ø
    • Gas channels 3–4
    • ECR setup

    Related Applications:

    • Photoresist Ashing
    • SU8 Ashing