7200 RF Plasma System
The 7200 Series is a low pressure RF plasma system designed for general purpose cleaning and surface modification.
9200 RF Plasma System
The 9200 is a RF isotropic batch plasma etching/ashing system. Available with optional high temperature capabilities for photoresist removal, nitride etch, and other cleaning applications in semiconductor and MEMS fabs.
M4L RF Gas Plasma System
The M4L™ is our most popular full featured plasma surface modification system designed for laboratory and production use.
