Bond Pad Cleaning | Semiconductor Application | PVA TePla America, Inc. | 800-527-5667
   
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Plasma Based Solutions:

Semiconductor wafer
Photoresist Ashing
Ultra Thin Wafer
Wafer Stress Relief
Chip Side Stress Relief
Post CMP Treatment
Wafer Thinning
Surface Passivation
Solar Cells
Solar Cell Etching
MEMS
MEMS SU8 Ashing
Flat Panel Displays
Pixel Activation
FP Photoresist Ashing
Bond Finger Cleaning
Chip Packaging
Bond Pad Cleaning
Flip Chip Underfill
Encapsulation
Wafer Metrology
Stress Imaging
Implant Dosage
Failure Analysis
Decapsulation

Plasma Cleaning prior to Wire Bonding

In chip packaging, plasma cleaning is essential for improving the cleanliness of bond pads prior to wirebonding. Ball shear and stitch pull strengths are dramatically enhanced by surface plasma cleaning. Ideally, during the pull test the wire should remain welded to the bond pad while it is broken midspan. PVA TePla´s unique microwave plasma efficiently removes organic contaminants and thin oxide layers from the bond pads with unparalleled throughput. Microwave plasma processing allows for tailored surface cleaning and conditioning through the application of our proven and cost effective systems.

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