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IoN 300 Gas Plasma System

Technical Data

Process Chamber
Material    Aluminum (standard)
Chamber Volume
300 liters (approximately) 18,236 cubic inches
Chamber Dimensions
419 x 441 x 1645 mm 16.5 x 17.38 x 64.75 L

Process Gas
Mass Flow Control
up to 6 gasses

Process Pressure
120-2000 mTorr/ 0.16-2.66millibar
Evacuation Time
~1 minute (pump dependent)
RFGenerator
Air cooled
Frequency
100KHZ, 13.56 MHz
Power Output
0-1000 watts (standard)
0-1250 watts air cooled (optional)

PowerRequirements
Electricity
208-240 VAC, 3 phase 30A
50/60 Hz 5-wire (standard)
380-415 VAC, 3 phase 15A
50/60 (optional)
Process Gas
Input pressure 1-2bar / 30 PSI
Purge Gas
Input pressure 1-2bar / 30 PSI
Compressed Air
Input pressure 5bar / 75 PSI
Chassis
Self contained footprint featuring all
power and gasconnections
Roll around chassis with leveling feet
Dimensions
1473 x 1064 x 1941mm
58” x 41.9” x 76.4”
Weight
Control Cabinet
228 kg / 503 lbs.
Chamber Cabinet
239 kg / 527 lbs.

Options

  • Stainless Steel Chamber
  • 1% pressure monitor
  • Recirculating liquid chiller
  • Pressure controller
  • Light tower
  • Barcode reader
  • Spectrographic endpoint detection
  • MFC upgrade for corrosive gasses
  • Printer
  • Monomer processing kit
  • H2 generator unit
  • Wall mount package
  • Vacuum pumps (rotary vane, dry, scroll and blower package)
  • Vapor phase MFC

Safety Certification Standards

  • CE certified
  • EN 60204
  • EN 61326

 


IoN 300 Plasma System

The IoN 300 is our latest advancement in vacuum plasma technology. Gas plasma is fast becoming the technologyof choice for surface modification of materials in the lifesciences, electronic and industrial arenas due to its versatilityandlow impact to our environment. For example, the trendtowards miniaturization in medical diagnostics requires precision cleaning, and selective chemical functionalization.Plasma removes organic contamination several orders of magnitude more efficiently than wet chemical processing and can chemically functionalize surfaces at the nano-scale.As a result, plasma is replacing older types of treatments that are no longer practical or economical.

The IoN 300 meets the ultra high volume production requirements of our customers, emphasizing versatility and control for their surface treatment needs. Its advanced features provide state of the art process control, fail-safe system alarms and data capturing software. This enables the equipment to meet the stringent control programs in the Life Science industries. The IoN 300 uses radio frequency (RF) generated plasma in a compact, fully integrated package.
One very unique feature of the IoN 300 is the ability to quickly and easily alternate electrodes between multiple shelves (up to 30) or a secondary plasma configuration for multiple use treatments of components.


Features include:

  • Configurable chamber that can accommodate various electrode configurations for high volume component treatment or unique hanging catheter processing
  • Plug and Play self installation
  • Onboard gas generator package option
  • Energy saving control feature for lowest cost of ownership
  • Industrial computer with a Windows® based system
  • Graphical User Interface (GUI) software complies with CFR Title 21 Part 11 and Semi E95-1101
  • User access control for separate process development, operator and maintenance programming and control
  • Configurable process tolerance controls allowing precise lot- to-lot repeatability
  • Remote statistical process control monitoring via Ethernet
  • Onboard diagnostic features and alarm logging
  • Recipe editor offers fast and versatile step control functionality
  • Liquid Crystal Display (LCD) touch panel and keyboard

 


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