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    • PVA TePla America, LLC
    • 251 Corporate Terrace
      Corona, Ca 92879.
    PVA TePla America, LLC/Products/RF Plasma Systems/Plasma Surface Treatment & CVD Deposition/Ion 40 Plasma System

    Ion 40 Plasma System

    IoN 40 Plasma System

    The IoN 40 Plasma System is a barrel plasma reactor designed for R&D and production applications. The technology is based on the proven reactor designs developed over the course of 50+ years by International Plasma Corporation, Branson IPC, Dionex, Gasonics, Metroline, TePla and finally PVA TePla. PVA TePla is a proven and trusted resource globally for high-quality, reliable, cost-effective and easy to operate Gas Plasma Systems. It offers some of the most advanced and innovative solutions for a wide variety of applications.

    FEATURES INCLUDE:

    • Small foot print table top design
    • Plug and play self installation
    • Flexible electrode
    • Industrial computer with LCD touch panel and keyboard.
    • Windows based operating system.
    • Graphical User Interface (GUI) software complies with CFR Title 21 Part 11 and Semi E95-1101
    • Multi-level user access
    • Software
    • Recipe editor for fast and versatile step controls
    • Onboard diagnostic features and alarm logging
    • Remote process monitoring via Ethernet
    • Online web based simulation/training/support

    TYPICAL APPLICATIONS:

    • Surface cleaning
    • Surface activation
    • Surface functionalization
    • Deposition of siloxane and organic thin films

    Technical Data

    Process Chamber

    • Material: Aluminum
    • Dimension: 330 mm W x 483mm D x 229mm H
    • (13”x19”x9”)
    • Volume: 36.43 L (1.29 ft3)
    • Electrodes: Removable 5 Shelf
    • Mass Flow Controller (MFC): 1
    • Process Pressure: (0.16 to 2.66 mbar
    • (120 to 2000) mTorr)
    • Base Pressure: 0.07 mbar (50 mTorr)
    • Pumping Time: 1 min (Pump dependent)
    • Loading: Manual

    Plasma Generator

    Frequency/Power: 13.56 MHz/300 W

    Options

    • Automated robotic loading/unloading
    • Stainless steel chamber
    • Electrodes:
    • Shelf electrodes 3/5
    • Multi-shelf with 3/5 or 7 shelves
    • Removable 3 shelves
    • Vertical, side wall or ceiling
    • Water cooled—horizontal 3 shelves
    • Powered cage
    • Secondary plasma
    • Faraday/Etch cage
    • Plasma generators
    • 13.56 MHz/600 W
    • (20 to 100) kHz/300 W or 600 W
    • Additional MFCs/up to additional five gasses
    • Corrosive gas MFCs
    • Liquid monomer delivery kits
    • High/Low vapor pressure monomers
    • Process pressure control
    • Light tower with R/Y/G/Buzzer
    • Vacuum pumps (Rotary vane, dry)
    • Gas (H2, N2, O2) generation package
    • SECS/GEM interface

    IoN 40 Plasma System Dimension and Weight

    • 737 mm W x 663 mm D x 711 mm H (29”x26”x28”)
    • 156.36 kg (345 lb) (Varies with options)

    Performance Data

    • Uptime: 95%
    • MTBF: >500 h
    • MTTR: <2 h

    Facilities Requirements

    • Electricity: (110/220) VAC, 1f, 50/60 Hz, 3 wire,
    • 2.3 kW
    • Process Gas Input Pressure: 2 bar (30 psi)
    • Purge Gas Input Pressure: 2 bar (30 psi)
    • Compressed Air Input Pressure: 6 bar (88 psi)

    Safety Certification Standards

    • CE certified
    • EN 61010
    • EN 61326