Plasma Cleaning, Etching, Activation
     
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Semiconductor Applications  

Plasma Based Solutions:

Semiconductor wafer
Photoresist Ashing
Ultra Thin Wafer
Wafer Stress Relief
Chip Side Stress Relief
Post CMP Treatment
Wafer Thinning
Surface Passivation
Solar Cells
Solar Cell Etching
MEMS
MEMS SU8 Ashing
Flat Panel Displays
Pixel Activation
FP Photoresist Ashing
Bond Finger Cleaning
Chip Packaging
Bond Pad Cleaning
Flip Chip Underfill
Encapsulation
Wafer Metrology
Stress Imaging
Implant Dosage
Failure Analysis
Decapsulation

 

SEMICONDUCTOR

PVA TePla AG specializes in advanced Microwave Plasma Processing systems for silicon and compound semiconductors (i.e. power devices, HB-LED, MEMS, PLED, and Solar Cell manufacturing). Front-End solutions include batch and single wafer systems for photoresist ashing and descum, as well as removal of polymers, SU8 Removal and sacrificial layers for MEMS fabrication. Back-End / Advanced Chip Packaging applications include plasma wafer cleaning and surface activation prior to wirebond and encapsulation for Flip Chip, stacked dies, MCM and advanced Cu lead frames. Pre-Assembly solutions include Wafer Stress Relief, Background Stress Relief, Chip Side Healing (CSH) and passivation for ultra-thin wafer technologies down to 25µm thickness. Our wafer metrology tools offer unique stress/defect analysis (SIRD) and ion implantation monitoring (TWIN) for quality inspection on 300mm wafers in high volume manufacturing.

 
 
 

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