Uniform Plasma cleaning of large substrates for manufacturing of display requires a scalable system concept. The planar microwave plasma systems are designed for such applications and deliver fast and uniform cleaning or stripping results. The microwave plasma process benefits from high radical concentration and plasma density along with low process-induced heating. Good uniformity is essential for maintaining excellent process control on a single substrate as well as for run-to-run repeatability.
Uniform Plasma cleaning of large substrates for manufacturing of display requires a scalable system concept. The planar microwave plasma systems are designed for such applications and deliver fast and uniform cleaning or stripping results. The microwave plasma process benefits from high radical concentration and plasma density along with low process-induced heating. Good uniformity is essential for maintaining excellent process control on a single substrate as well as for run-to-run repeatability. 
