Chip Side Healing | Semiconductor Application | PVATePla America, Inc. | 800-527-5667
Chip Side Healing using remote cold plasma
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Ultra Thin Wafers  

Plasma Based Solutions:

  Semiconductor Wafers
Photoresist Ashing
Ion Beam Etching
  Ultra Thin Wafers
Wafer Stress Relief
Chip Side Stress Relief
Post CMP Treatment
Wafer Thinning
Surface Passivation
  Solar Cells
Solar Cell Etching
  MEMS
MEMS SU8 Ashing
  Flat Panel Displays
Pixel Activation
FP Photoresist Ashing
Bond Finger Cleaning
  Chip Packaging
Bond Pad Cleaning
Flip Chip Underfill
Encapsulation
  Wafer Metrology
Stress Imaging
Implant Dosage
  Failure Analysis
Decapsulation
 
   Industrial Medical

Chip Side Healing (CSH)

Chip Side Healing Stress ReliefDuring the singulation process a high speed rotating dicing saw or high energy laser beam separates the chips. The silicon material within the “street” proximity is as much destroyed as the backside of the wafer after grinding. The quality of the side walls is a determining factor in the strength of the die. Remote plasma treatment allows access to the side walls of the chips immediately after dicing. Pure, dry, chemical isotropic etching, can be applied to the back-side after singulation (DBG-Process) or after dicing from the front side. We call this process CSH (Chip Side Healing). Once the silicon is treated on all side walls of the chip as well as on the back side, the maximum physical die strength is achieved (“the perfect die”). Chip Side Healing can be applied in-situ with Passivation.

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Chip Side Healing using a remote cold plasma

chipside healing using a remove cold plasma

Downloads:

- Flyer about ultra thin wafers and chips (Flexibility after CSH process “Chip Side Healing”)

- New Brochure about all our Ultra Thin Wafer Applications

To Request Application Literature or Further Information, Click Here

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What is plasma?
 
Why Microwave?
 
Why
Ultra Thin Wafers?
 
 
  Why Stress Relief?
 
 

Why
Plasma Treatment?

 

 

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