Microwave (MW) generated plasma is the superior plasma technology for microchip fabrication.

MW plasmas produce far fewer sputtered impurities compared with DC or RF discharges. This is due in part to ‘electrodeless’ plasma generation and in part to significantly reduced substrate biasing, an essential characteristic for sensitive gate oxides. The highly isotropic nature of MW plasmas makes this technology ideal for applications such as photo-resist structure release on MEMS devices and flip chip underfill activation in chip packaging applications.

PRODUCT LISTING

Photoresist Ashing (Standard & SU8)

PS 300 PS 4008 PS 600 PS 90

Wafer Thinning / Stress Relief / Passivation / Post CMP Treatment

PS 80 PLUS ASYNTIS PS 4008 ASYNTIS / OEM ASYNTIS 2.2

Chip Packaging

PS 400/660 PS 400/660 IL PS 400 H2 PS 80 Plus

Flat Panel Wafer Metrology

PS 4011 SIRD TWIN

Ion Beam Etching Solar Cell Etching

Ribetch 160 ECR PS 400 Solar