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Microwave Plasma Systems

Microwave generated plasma is the superior plasma technology for microchip fabrication.
Microwave plasma creates an etching process, which is very isotropic and behaves very similar to a wet stripping process. The very high electron density and low kinetic ion energy makes this process ideal for removal of polymers while causing very little surface damage.

Removal of Polymers: standard photo resist, polyimide, SU-8
gigabatch
gigabatch
gigafab
gigafab
Strip Type System
Solar Cell Etching
giga 80 plus
Solar etching
Bench Top
Single Wafer Ashing
IoN Wave 10
GigaFab Modular
Chip Packaging
giga 690
ps 400 h2
OLED / PLED
Wafer Metrology
gigafab gen 2
TWIN
Wafer Metrology
 
SIRD
 
 
APPLICATIONS

Removal of Polymers: standard photo resist, polyimide, SU-8
Chip Packaging
OLED / PLED
Wafer Metrology
Solar Cell Etching



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