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Microwave (MW) generated plasma is the superior plasma technology for microchip fabrication.

MW plasmas produce far fewer sputtered impurities compared with DC or RF discharges. This is due in part to ‘electrodeless’ plasma generation and in part to significantly reduced substrate biasing, an essential characteristic for sensitive gate oxides. The highly isotropic nature of MW plasmas makes this technology ideal for applications such as photo-resist structure release on MEMS devices and flip chip underfill activation in chip packaging applications.

PRODUCT LISTING

Photoresist Ashing (Standard & SU8)

PS 300

PS 4008

PS 4008

PS 600

PS 600

PS 90

Wafer Thinning / Stress Relief / Passivation / Post CMP Treatment


PS 80 PLUS ASYNTIS

4008

PS 4008 ASYNTIS / OEM

ASYNTIS 2.2

ASYNTIS 2.2

Chip Packaging

PS 400

PS 400/660

PS 660

PS 400/660 IL

PS 400 H2

PS 80 Plus

 
Flat Panel
Wafer Metrology

PS 4011

SIRD

SIRD

TWIN

TWIN

 

Ion Beam Etching
Solar Cell Etching

CAIBE

Ribetch 160 ECR

PS 400 Solar

PS 400 Solar



 

  What is plasma?
 
  Why Microwave?
 
 
New Photoresist Asher for laboratory or
pilot scale
PS 210

 

 

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