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Microwave Plasma Systems

Microwave generated plasma is the superior plasma technology for microchip fabrication.
Microwave plasma creates an etching process, which is very isotropic and behaves very similar to a wet stripping process. The very high electron density and low kinetic ion energy makes this process ideal for removal of polymers while causing very little surface damage.

 
Removal of Polymers: standard photo resist, polyimide, SU-8
gigabatch
gigabatch
gigafab
gigafab
 
GIGABatch series
GIGAfab series
         
Wafer Thinning / Stress Relief / Post CMP Treatment
  Bench Top System
giga 80
gigafab
 
GIGA 80 Plus Asyntis GIGAfab Asyntis M  
Ion Wave 10
 
         
Chip Packaging
giga 80 plus
giga 690
ps 400 h2
   
GIGA 80 Plus
GIGA 690
PS 400 H2
   
         
OLED / PLED
Wafer Metrology
Solar Cell Etching
gigafab gen 2
SIRD
TWIN
 
GIGAfab Gen 2
SIRD
TWIN
GIGA 690 solar  
 
APPLICATIONS

Removal of Polymers: standard photo resist, polyimide, SU-8
Wafer Thinning / Stress Relief / Post CMP Treatment
Chip Packaging
OLED / PLED
Wafer Metrology
Solar Cell Etching



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