Microwave generated plasma is the superior plasma technology for microchip fabrication.
Microwave plasma creates an etching process, which is very isotropic and behaves very similar to a wet stripping process. The very high electron density and low kinetic ion energy makes this process ideal for removal of polymers while causing very little surface damage.

Removal of Polymers: standard photo resist, polyimide, SU-8
Wafer Thinning / Stress Relief / Post CMP Treatment
Chip Packaging
OLED / PLED
Wafer Metrology
Solar Cell Etching