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IoN 40Q Plasma System
The IoN 40Q is a plasma barrel ashing system based on the batch
ashing Branson/IPC 9000 series ashers. It is designed
for batch processing wafers for photoresist strip, descum,
nitride etch and other cleaning applications in semiconductor,
LED, and MEMS fabrication. The IoN 40Q technology is based
on proven RF asher reactor designs developed by our company and its
ancestors over 40 years (International Plasma Corporation,
Branson IPC, Dionex, Gasonics, Metroline, TePla and finally
PVA TePla).
Today’s IoN 40Q is designed to meet the evolving demands
of our customers, emphasizing versatility and control for their
surface treatment needs. Its advanced features provide state
of the art process control, fail-safe system alarms and data
capturing software. This enables the system to meet
stringent quality control programs required to manufacture
Semiconductor, LED and MEMS devices. The IoN 40Q uses
radio frequency (RF) generated plasma in a compact, fully
integrated package.
Standard Features
- Low particulate quartz reactor chamber
- Plug and play self installation
- Energy saving control feature for lowest cost of ownership
- Industrial computer with a Windows® based system
- Graphical User Interface (GUI) software complies to Semi E95-1101 standards
- User access control for process development and maintenance
- Sophisticated alarm features and process tolerance controls allowing precise lot-to-lot repeatability
- Data logging and process statistics monitoring via Ethernet
- Onboard diagnostic features and alarm logging
- Recipe editor offers fast and versatile step control functionality
- LCD touch panel and keyboard
- Optical end point detection
- Selectable fast or slow venting modes
- Through-wall mounting with full rear maintenance capability
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