ION 3 Low Cost Plasma System
     
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IoN 3 KHZ LOW COST PLASMA SYSTEM

Technical Data

Process Chamber
Material
High grade Aluminum

Volume
~3 Liters, rectangle chamber

Inner Dimensions
125 W x 125 H x 175 mm D
5”W x 5”H x 7”D

Substrate Work Area
100 W x 75 H x 150 mm D
4”W x 3”H x 6”D

RF Generator
100KHz,
Preset to 75 Watts
No tuning required

Power Requirements
Electricity
110 VAC or 220 VAC single phase, 10
amp 50/60 Hz, 3 wire

Process Gas
Regulated to 10 PSIG Connections
made by either .25” O.D. stainless steel
or Teflon tubing

External Gas
.25” FPT, Vacuum pump: KF40 Flange

Dimensions
406.4 W x 406.4 H x 660.4 mm
16”W x 16”H x 26”L

Weight
With vacuum pump: 95 lbs
(43 kg)

Options

  • 7CFM 2 stage rotary vane vacuum pump with PFPE
  • Spare Parts Kit
  • Table

Safety Certification Standards

  • CE Certified

 

IoN 3 KHz Plasma System
The IoN 3 KHz is our latest advancement in table top low cost vacuum plasma systems. The IoN 3 KHz is a simple to use manually controlled plasma reactor. It has an anodized aluminum chamber. It is ideal for University research laboratories. The system has a 100 KHz RF power supply with a preset power setting at 75 Watts, Controllable parameters include, time, pressure, gas flow and mixture. The IoN3 KHz comes standard with 2 gas flow meters and can be used with CDA, Oxygen, Argon or Nitrogen gas. The chamber volume is 125 mm W x 125 mm H x 175 D mm. The electrodes allow for small components with a maximum working area of 100 mm W x 75 mm H x 150 mm D. Applications include precision cleaning bond promotion, surface activation, photo resist ashing and etching.

RIE or Plasma
The system comes with a sample holder with 2 shelves. The user can place their samples on the top shelf for RIE processing or the bottom shelf for plasma processing. RIE processing is more aggressive and the bottom plasma shelf is a more gentle process.

Features include:

  • Chamber Pressure Control
  • High Grade Aluminum Chamber
  • For use with CDA, Oxygen, Argon or Nitrogen
  • Diagnostics LED Display
  • Instructional video and user manual
  • Unique electrode design
  • Sheet metal used in the IoN 3 KHz system is custom coated to
    increase RF containment
  • N2 purge standard
  • Timer


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