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IoN 18 Gas Plasma System |
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Technical Data Process Chamber
Safety Certification Standards
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IoN 18 Plasma System The IoN 18 is our latest advancement in low cost vacuum plasma technology. Gas plasma is fast becoming the technology of choice for surface modification of materials in the life sciences, electronic and industrial arenas due to its versatility and low impact to our environment. For example, the trend towards miniaturization in medical diagnostics requires precision cleaning and activation. Plasma removes organic contamination several orders of magnitude more efficiently than wet chemical processing. As a result, plasma is replacing older types of treatments that are no longer practical or economical. The IoN 18 is designed to meet the evolving demands of our customers, emphasizing outstanding versatility and control at a very low cost for our customers surface treatment needs. Its advanced features provide state of the art process control, fail-safe system alarms and data capturing software. This enables the system to meet stringent quality control programs in many different markets. The IoN 18 uses radio frequency (RF) generated plasma in a compact, fully integrated package. Its bench top design allows for easy installation in laboratory or production environments. The IoN 18 offers a significant advantage over similar systems. It can be easily field upgraded to meet higher volume requirements or advanced processing capabilities without the need to procure a different machine. Features include:
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