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IoN 140 Plasma System

Technical Data

Process Chamber
Aluminum (A)
Chamber Volume
140 liters
Inner Dimensions
375 x 375 x 965 mm L
14.76” x 14.76” x 38”L

Process Gas
Mass Flow Control
up to 6 gasses

Process Pressure
Approx. 120-2000 mTorr
Evacuation Time
~1 minute (pump dependent)
Air cooled
100KHZ, 13.56 MHz, 2.45GHz
Power Output
0-600 watts (standard)
0-1250 watts air cooled (optional)

208-240 VAC, 3 phase 30A
50/60 Hz 5-wire (standard)
415-480 VAC, 3 phase 15A
50/60 (optional)
Process Gas
Input pressure 1-2bar / 30 PSI
Purge Gas
Input pressure 1-2bar / 30 PSI

Compressed Air
Input pressure 5bar / 75 PSI

Self contained footprint featuring all power and gas
Roll around chassis with leveling feet
635 x 1120 x 1473 mm
29” x 78” x 58”(IoN 140)
135 liters - A
350.45 kg / 771 lbs. (standard)


  • 1% pressure monitor
  • Recirculating liquid chiller
  • Pressure controller
  • Light tower
  • Barcode reader
  • Spectrographic endpoint detection
  • MFC upgrade for corrosive gasses
  • Printer
  • Monomer processing kit
  • H2 generator unit
  • Wall mount package
  • Vacuum pumps (rotary vane, dry, scroll and blower package)
  • Vapor phase MFC


  • CE certified
  • EN60204
  • EN61326

The IoN 140 is our latest advancement in vacuum plasma
technology. Gas plasma is fast becoming the technology of
choice for surface modification of materials in the lifesciences,
electronic and industrial arenas due to its versatility and low
impact to our environment. For example, the trend towards
miniaturization in medical diagnostics requires precision
cleaning, and selective chemical functionalization.Plasma
removes organic contamination several orders of magnitude
more efficiently than wet chemical processing andcan
chemically functionalize surfaces at the nano-scale.Asa
result, plasma is replacing older types of treatments that are
no longer practical or economical.

The IoN 140 is designed to meet the evolving demands of our
customers, emphasizing versatility and control for theirsurface
treatment needs. Its advanced features provide state of the art
process control, fail-safe system alarms and data capturing
software. This enables the system to meet stringentquality
control programs in the Life Science industries. The IoN140
uses radio frequency (RF) generated plasma in acompact,
fully integrated package. Another design feature ofthenew
IoN 140 is the ability to quickly and easily alternatebetween
different chamber types and electrode configurations.

Features include:

  • Compressed Air
  • Input pressure 5bar / 75 PSI
  • Flexible quick change electrode and chamber options
  • Plug and Play self installation
  • Onboard gas generator package option
  • Energy saving control feature for lowest cost of ownership
  • Configurable chamber that can accommodate various electrode
    configurations for small sized complex 3-dimensional parts or high
    volume large part processing
  • Industrial computer with a Windows® based system
  • Graphical User Interface (GUI) software complies with CFR Title 24 Part 11 and Semi E95-1101
  • User access control for separate process development, operator and maintenance programming and control
  • Configurable process tolerance controls allowing precise lot-to-lot repeatability
  • Remote statistical process control monitoring via Ethernet
  • Onboard diagnostic features and alarm logging
  • Recipe editor offers fast and versatile step control functionality
  • Liquid Crystal Display (LCD) touch panel and keyboard

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