Plasma System 4011 | PVATePla America, Inc.
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Microwave Plasma System 4011

Technical Specifications:

Plasma Chamber: Aluminum,
W x H x D = 720 x 140 x 620 mm

Plasma Generation: MW Frequency 2.45 GHz, max. 4000 Watt, variable power

System Dimension:
W x H x D = approx. 1.750 x 1.700 x 950 mm

Weight: 750 kg

Options:
  Waste Gas Cleaning System
  Additional Gas Channel

 

Related Applications:

  • Pixel Activation
  • Flat Panel Photoresist Ashing
  • Bond Finger Cleaning
  •  

    PS 4011
    (manual and automatic robot loading version)

    The plasma system 4011 is designed for process development of flat panel displays. The chamber is loaded manually. The glass plates are easily placed in a flat position on the extractable drawer. Depending on the gas selected, the plasma has various chemical effects on the surface to be treated. The efficient microwave plasma source has no electrodes, ensuring fast and uniform processing of large substrates.

    The PS4011 version for small volume and pilot line production is also available with gate valve and lift pins for automatic loading by a loading robot.


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